RESEARCH – HPLAS

งานวิจัย (Publications)

Publication Name Redeposition-free of silicon etching by CF4 microwave plasma ina medium vacuum process regime

First Author Pakpum, C.

Author Prof. Dr.Dheerawan Boonyawan,

Corresponding Author Pakpum, C.

Year2020

JournalSurface and Coatings Technology

Web Resources :

https://www.scopus.com/record/display.uri?eid=2-s2.0-85086068373&origin=inward&txGid=4c3102d6cff272eb25c688676241f428